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CSD Materials

What are CSD Materials?

CSD materials refer to materials used in Chemical Solution Deposition (CSD)—a method for forming thin films by applying and firing solutions of metal organic acid salts or other compounds.

About CSD Materials

These liquid materials enable the easy formation of oxide thin films by applying the solution onto a substrate via dip coating or spin coating, drying, and subsequently performing heat treatment.

CSD materials are excellent research materials for evaluating the initial characteristics and exploring the potential of functional ceramic thin films. Their primary advantage in mass production lies in low material costs as well as affordable production equipment and facilities.

Our CSD product lineup covers elements across the periodic table and is widely utilized and supported by researchers in various fields.

Formation Methods

Dip Coating Method

A method in which the substrate is immersed in a coating material solution and slowly withdrawn to form a liquid film on the substrate.

Spin Coating Method

A method in which the coating material solution is dispensed onto a spinning substrate, using centrifugal force to form a uniform film.

Classification of CSD Materials

MOD Coating Materials

These are solutions prepared by dissolving metal-organic compounds, mainly organic acid salts, in organic solvents. MOD coating materials place particular emphasis on substrate wettability and are formulated for easy application onto various wafers, SiO₂ substrates, glass substrates, and other surfaces using methods such as spin coating and dip coating.

Sol-Gel type coating materials

These are materials in which metal compounds such as alkoxides are dissolved and reacted to form colloids, which are then dispersed in a solvent. Since they contain almost no unnecessary molecular components and the main component in the liquid itself forms the ceramic framework, they generally have excellent film-forming properties.


(1) Sol-Gel Method Materials

Product Name Main Components Concentration (wt%)
Si-05S SiO₂ 5
PS-05S SiO₂-P₂O₅ 5
BPS-05S SiO₂-P₂O₅-B₂O₃ 5
BS-05S SiO₂-B₂O₃ 5
Ti-03-P TiO₂ 3
Ti-05-P TiO₂ 5

(2) MOD Coating Materials

Single Metal Thin Film Coating Materials

Product Name Main Component Metal Concentration (wt%)
Al-03-P Al₂O₃ 3
Ba-06C BaO 6
Bi-05 Bi₂O₃ 5
Ca-03 CaO 3
Ce-03 CeO₂ 3
Co-03 CoO 3
Cr-03C Cr₂O₃ 3
Cu-03A CuO 3
Er-03 Er₂O₃ 3
Fe-03 Fe₂O₃ 3
Ga-03 Ga₂O₃ 3
Hf-05 HfO₂ 5
In-05 In₂O₃ 5
La-03 La₂O₃ 3
Mn-03 Mn₃O₄ 3
Nb-05 Nb₂O₅ 5
Ni-03 NiO 3
Pb-05 PbO 5
Pb-10C PbO 10
Pr-03 Pr₆O₁₁ 3
Sm-03 Sm₂O₃ 3
Sn-05 SnO₂ 5
Sn-10C SnO₂ 10
Sr-06C SrO 6
Ta-10-P Ta₂O₅ 10
Ti-03 TiO₂ 3
V-02 V₂O₅ 2
Yb-03 Yb₂O₃ 3
Zn-05 ZnO 5
Zr-05-P ZrO₂ 5

Composite Metal Thin Film Coating Materials

Product Name Main Component Metal Concentration (wt%)
BT-06 BaTiO₃ 6
BST-06-P(70/30) (BaSr)TiO₃ 6
BiFe-03 Bi₂O₃+Fe₂O₃ 3
LA-05 LaAlO₃ 5
LT-03 LiTaO₃ 3
MT-05 MgTiO₃ 5
PT-10 PbTiO₃ 10
PT-25 PbTiO₃ 25
PZ-20 PbZrO₃ 20
PZT-10 Pb(ZrTi)O₃ 10
PZT-20 Pb(ZrTi)O₃ 20
PZT-50(10/52/48) Pb(ZrTi)O₃ 20
PLZT-10 (PbLa)(ZrTi)O₃ 20
PLZT-20 (PbLa)(ZrTi)O₃ 20
ST-06 SrTiO₃ 6

(3) EMOD Coating Materials

Product Name Main Component Metal Concentration (wt%)
SYM-AL04 Al₂O₃ 0.4
SYM-BA05 BaO 0.5
SYM-BI05 Bi₂O₃ 0.5
SYM-CA05 CaO 0.5
SYM-CE03 CeO₂ 0.3
SYM-CO04 CoO 0.4
SYM-CS03 Cs₂O 0.3
SYM-CR015 Cr₂O₃ 0.15
SYM-CU04 typeS CuO 0.4
SYM-DY01 Dy₂O₃ 0.1
SYM-EU01 typeS Eu₂O₃ 0.1
SYM-FE05 Fe₂O₃ 0.5
SYM-GA03 Ga₂O₃ 0.3
SYM-HF04 HfO₂ 0.4
SYM-IN02 In₂O₃ 0.2
SYM-LA01 typeS La₂O₃ 0.1
SYM-MG05 MgO 0.5
SYM-MN05 MnO₂ 0.5
SYM-NB05 Nb₂O₅ 0.5
SYM-NI05 NiO 0.5
SYM-PB05 PbO 0.4
SYM-RB03 Rb₂O 0.3
SYM-SN05 SnO₂ 0.4
SYM-SR05 SrO 0.5
SYM-TA05 Ta₂O₅ 0.5
SYM-TI05 TiO₂ 0.5
SYM-YB01 typeS Yb₂O₃ 0.1
SYM-ZR04 ZrO₂ 0.4

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