ALD/ALE 2019 にて講演します。
AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)
Title： Atomic Layer Deposition of Gallium Oxide Thin Films Using (Pentamethylcyclopentadienyl)gallium(I)
Speaker：Fumikazu Mizutani1,Shintaro Higashi1,Mari Inoue2, Toshihide Nabatame2
(1 Kojundo Chem,2 National Institute for Materials Science)
Date: July 21-Wednesday, July 24, 2019
Venue:, the Hyatt Regency Bellevue in Bellevue, Washington
